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Seminário de implantação iônica – Material transformation: Interaction between nuclear, electronic and potential energy deposition (M. Toulemonde).

17 de outubro:15:00

Material transformation: Interaction between nuclear, electronic and potential energy deposition.

Palestrante: M. Toulemonde – Centre de Recherche sur les Ions, les Matériaux et la photonique, CIMAP-GANIL, (CEA, CNRS, ENSICAEN, Univ. Caen), 14070 Caen, France

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Abstract: The interaction between nuclear, electronic and potential energy deposition induced by an individual ion are described and illustrated by five different experiments. Each experiment shows the different behaviors of the combined interactions. Defects created by nuclear energy loss are annealed by electronic energy loss in Fe irradiated by ions in the GeV energy regime, showing a /competitive/ interaction, i.e. the combination of the two phenomena leads to a number of defects less that the one expected (1+1synergetic interaction; i.e. the sputtering rate of target is larger than the one expected when considering each process independently (1+1>2). Damage formation in crystalline and amorphous SiO_2 is enhanced by ions in the MeV regime, evidencing a /cooperative/ interaction, i.e. each process is added together (1+1>1 and 2 can be induced by combine processes of electronic energy loss and potential energy showing also a /cooperative/ effect. It will be shown how these different phenomena can be explained by a transient thermal process combining the elastic and inelastic thermal spike model.

Detalhes

Data:
17 de outubro
Hora:
15:00
Categoria de Evento:

Local

Sala de Seminários do Laboratório de Implantação Iônica (Prédio 43176)